Comparative assessment of requirements imposed on premises for the placement of high-precision production facilities

The fundamental principles of design and criteria for the placement of high-precision equipment intended for the production of microelectronic components and the study of micron and submicron structures are considered.The main aspect of the article is focused on protection from vibration of natural and man-made origin, which is present in almost any construction site. The main goal of vibration minimization is to prevent the occurrence of oscillations that can distort measurement data and disrupt the operation of high-precision equipment, such as electron microscopes, lithographic installations and nanometer control systems. The modern requirement for vibration is the maximum permissible vibration velocity from 3 μm/s to 0.5μm/s or less, depending on the equipment and research purposes. The article analyzes the requirements of domestic and foreign regulatory and advisory documents for base vibration levels in places where high-precision equipment is installed. The results of measurements and assessment of vibration levels at a typical facility are presented in accordance with the specified requirements.