Thermodynamic Modeling and Experimental Implementation of the Synthesis of Vanadium Oxide Films

V. A. Shestakov; Шестаков В. А.; V. A. Seleznev; Селезнев В. А.; S. V. Mutilin; Мутилин С. В.; V. N. Kichay; Кичай В. Н.; L. V. Yakovkina; Яковкина Л. В.

doi:10.31857/S0044457X23600019

Thermodynamic Modeling and Experimental Implementation of the Synthesis of Vanadium Oxide Films

Authors: Shestakov V.A.¹^,2, Seleznev V.A.³, Mutilin S.V.³, Kichay V.N.¹, Yakovkina L.V.¹
Affiliations:
1. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
2. Novosibirsk State University of Architecture and Civil Engineering
3. Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences
Issue: Vol 68, No 5 (2023)
Pages: 651-657
Section: ФИЗИКО-ХИМИЧЕСКИЙ АНАЛИЗ НЕОРГАНИЧЕСКИХ СИСТЕМ
URL: https://ruspoj.com/0044-457X/article/view/665259
DOI: https://doi.org/10.31857/S0044457X23600019
EDN: https://elibrary.ru/SOHBQS
ID: 665259

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Abstract

The paper describes the thermodynamic modeling and experimental study of the synthesis of vanadium oxide films at various temperatures from the tetrakis(ethylmethylaminovanadium) V[NC3H8]4 precursor in the presence of oxygen in an argon atmosphere. The thermodynamic modeling was carried out using the calculation of chemical equilibria based on the minimization of the Gibbs energy of the system. In the experimental part of the paper, the films were synthesized by the atomic layer deposition procedure. The thermodynamic modeling and experimental results agree with each other and can be used to develop procedures for the synthesis of film coatings based on vanadium oxides.

Keywords

thermodynamic modeling, atomic layer deposition, thin films, vanadium dioxide, vanadium pentoxide

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