Modeling of Formation of Metal Microstructures by Local Electrodeposition on Conducting Substrate

V. M. Volgin; Волгин В. М.; T. B. Kabanova; Кабанова Т. Б.; I. V. Gnidina; Гнидина И. В.; A. D. Davydov; Давыдов А. Д.

doi:10.31857/S0424857023090116

Modeling of Formation of Metal Microstructures by Local Electrodeposition on Conducting Substrate

Authors: Volgin V.M.¹^,2, Kabanova T.B.², Gnidina I.V.¹, Davydov A.D.²
Affiliations:
1. Tula State University
2. Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences
Issue: Vol 59, No 9 (2023)
Pages: 483-494
Section: Articles
URL: https://ruspoj.com/0424-8570/article/view/670913
DOI: https://doi.org/10.31857/S0424857023090116
EDN: https://elibrary.ru/MPGYGU
ID: 670913

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Abstract

The formation of metal microstructures on metal substrates is theoretically analyzed by the example of local silver electrodeposition using the numerical simulation of interrelated electrochemical and homogeneous chemical reactions.
The distributions of the concentrations of the participants in the reactions and the current density of silver ion reduction are calculated for various concentrations of solution components and interelectrode distances. The degree of localization of metal deposition depends on the distribution of the concentrations of electroactive silver cations and the nonelectroactive complex of this metal near the anode. The conditions for reaching the maximum rate of local silver electrodeposition are determined.

Keywords

local electrodeposition, numerical simulation, metal microstructures, metal substrates, homogeneous chemical reactions

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