Controlled Nanostructuring of Thin Films by Oblique Deposition

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Using electron beam evaporation, thin films of various compositions (Al, Co, Ge, SiO2) were obtained on inclined Si(001) substrates. It was found that at angles of incidence of the evaporated material on the substrate of more than 70° (sliding deposition), arrays of free-standing inclined nanocolumns with lateral dimensions from 10 to 100 nm and an aspect ratio (length/transverse dimension) of at least 10 were formed on the substrate. When substrate rotation was switched on during film growth, an array of nanospirals twisted in one direction was formed. Such films are chiral metamaterials and have pronounced optical activity. Simulation of film growth processes under oblique deposition conditions using the Monte Carlo method showed good qualitative agreement with the experimental data. It was found that the observed processes of nanostructuring during inclined deposition are based on universal mechanisms of competition between growing crystalline grains under conditions of neighbor shading. This makes it possible to obtain nanostructured films of various materials with the required functional characteristics under such conditions.

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作者简介

O. Trushin

Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS

编辑信件的主要联系方式.
Email: otrushin@gmail.com
俄罗斯联邦, Yaroslavl, 150067

I. Fattakhov

Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS; Demidov Yaroslavl State University

Email: otrushin@gmail.com
俄罗斯联邦, Yaroslavl, 150067; Yaroslavl, 150003

M. Chebokhin

Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS; Demidov Yaroslavl State University

Email: otrushin@gmail.com
俄罗斯联邦, Yaroslavl, 150067; Yaroslavl, 150003

A. Popov

Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS

Email: otrushin@gmail.com
俄罗斯联邦, Yaroslavl, 150067

L. Mazaletsky

Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS; Demidov Yaroslavl State University

Email: otrushin@gmail.com
俄罗斯联邦, Yaroslavl, 150067; Yaroslavl, 150003

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2. Fig. 1. Schematic diagram of the oblique sputtering experiment: 1 - substrate; 2 - vaporised target; 3 - flow of electrons bombarding the target.

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3. Fig. 2. SEM images of films of different compositions (cross section (a, c, d, e, g) and top view (b, d, f, h)): a, b - Al; c, d - Co; e, f - Ge; g, h - SiO2. All films were obtained at an optimum tilt angle of 85°.

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4. Fig. 3. Schematic representation of the mechanism of nanospirals formation when including the rotation of the substrate around its normal to the plane.

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5. Fig. 4. SEM images of films of different compositions (cross section (a, c, e) and top view (b, d, f)): a, b - Co; c, d - Ge; e, f - SiO2. All films were obtained at an optimal tilt angle of 85° and a substrate rotation speed of 0.6 rpm.

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6. Fig. 5. Schematic of the model.

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7. Fig. 6. Views of the calculated cell after sputtering at an angle of 85°: a - without rotation; b - with the inclusion of rotation.

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